• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to a primary vacuum pump (1) of the dry type comprising: - at least two pumping stages (2a-2e) mounted in series between a suction (3) and a discharge (4) of the vacuum pump ( 1), - two rotors (5) extending in the pumping stages (2a-2e), the rotors (5) being configured to rotate synchronously in the opposite direction to cause a gas to be pumped between the suction (3 ) and the discharge (4), - an injection device (9) configured to distribute a purge gas in at least one pumping stage (2a-2e), comprising: ○ at least one injection member (12a- 12e), and ○ at least one injection valve (13; 16a-16e) controllable in all or nothing intended to be interposed between a supply source of purge gas and the at least one injection member (12a- 12e), characterized in that the vacuum pump (1) further comprises a control device (10) configured to control the opening and closing of the at least one v injection year (13; 16a-16e) for injecting a purge gas by successive pulses into at least one pumping stage (2a-2e). The present invention also relates to a method for controlling the injection of a purge gas into such a vacuum pump.
    公开号:FR3086705A1
    申请号:FR1858887
    申请日:2018-09-27
    公开日:2020-04-03
    发明作者:Serge Brandolin；Eric MANDALLAZ
    申请人:Pfeiffer Vacuum SAS；
    IPC主号:
    专利说明:

    Dry type primary vacuum pump and method of controlling the injection of a purge gas
    The present invention relates to a primary vacuum pump of the dry type such as the “Roots” or “Claw” or screw type. The present invention also relates to a method for controlling the injection of a purge gas into such a vacuum pump.
    The dry type primary vacuum pumps have several pumping stages in series in which a gas to be pumped circulates between a suction and a discharge. Among the known primary vacuum pumps, there are those with rotary lobes also known under the name "Roots" or those with spout, also known under the name "Claw" or those with screws. These vacuum pumps are called "dry" because in operation, the rotors rotate inside a stator without any mechanical contact between them or with the stator, which allows not to use oil in the pumping stages .
    Certain primary vacuum pumps are used in processes using chemistries which generate solid by-products, for example in the form of powder, paste or pieces. This is the case, for example, of certain processes for manufacturing semiconductors, photovoltaic screens, flat screens or LEDs. These solid by-products can be sucked in by the vacuum pump and alter its operation, in particular by impeding the rotation of the rotors or even preventing it completely in the worst case.
    To avoid this, several solutions are already known.
    For example, vacuum pumps are protected by installing powder traps at the pump inlet. These traps are for example made up of powder separators which retain the solid compounds by gravity or by centrifugal force.
    Another method used is to adapt the geometry of the vacuum pump to facilitate the evacuation of solid by-products, for example by increasing the diameter of the transfer channels or by arranging the pumping stages vertically.
    Also, injecting a purge gas into the vacuum pump participates in the evacuation of solid by-products in addition to diluting the pumped gases. For this, nitrogen or air is generally injected through injection nozzles distributed along the vacuum pump, at each pumping stage. This purge gas can participate in the pneumatic transport of solid powders.
    However, in some cases, these solutions may be insufficient because the nature of the solid by-products can allow them to adhere strongly to the walls and it is then more difficult to remove them.
    An object of the present invention is to at least partially resolve an aforementioned drawback of the state of the art.
    To this end, the invention relates to a primary vacuum pump of the dry type comprising:
    - at least two pumping stages mounted in series between a suction and a discharge of the vacuum pump,
    - two rotors extending in the pumping stages, the rotors being configured to rotate synchronously in the opposite direction to cause a gas to be pumped between the suction and the discharge,
    - an injection device configured to distribute a purge gas in at least one pumping stage, comprising:
    o at least one injection member, and o at least one all-or-nothing controllable injection valve intended to be interposed between a purge gas supply source and the at least one injection member, characterized in that that the vacuum pump further comprises a control device configured to control the opening and closing of the at least one injection valve for injecting a purge gas by successive pulses into at least one pumping stage.
    The command to open / close the at least one injection valve makes it possible to draw the injection of the purge gas alternating injection phases (or pulses) with phases without injection or with injection of lesser flow.
    This mode of injection in pulsed flow, that is to say by train of pulses, makes it possible to create wave fronts at the time of the injection allowing a separation of the solid by-products which is more effective than an injection continuous purge gas.
    In addition, the pulsed gas injection of the purge gas makes it possible to be able to maintain an average value of the flow of purged gas injected of the same order of magnitude as that of a conventional continuous purge gas injection.
    Controlling the at least one all-or-nothing injection valve makes it possible to produce control slots making it possible to ensure injection by successive pulses with rising edges having steep slopes which are more effective for detaching the by-products. solid. The slope of the rising edge of the purge gas flow on a pulse is for example greater than 100slm / s.
    The injection member, such as a calibrated orifice (also called a nozzle), an injection nozzle or such as a flow controller (or “mass flow”), is configured to limit the flow of gas purge in the pumping stage, for example at a value lower than 200 sim (or 338 Pa.m3 / s).
    The at least one controllable injection valve is for example a solenoid valve such as electromagnetic or piezoelectric. This valve can be controlled in all or nothing: it is either open or closed.
    The frequency and duration of the pulses can be adjusted according to the nature of the by-products to be discharged. It is thus possible to space or multiply the number of pulses according to the desired effect.
    The frequency (opening / closing rhythm), the duration, the duty cycle (opening time / closing time) and the amplitudes of the purge gas implusions can be parameters adjustable by the user by means of an interface. of the control device.
    The purge gas flow injected by pulses is for example between 10slm (or 17Pa.m 3 / s) and 120slm (or 202Pa.m 3 / s), such as 100slm (or 169Pa.m 3 / s).
    The pulse frequency is for example between 0.1 Hz and 5Hz, such as 0.5Hz, that is to say an opening every two seconds.
    The duty cycle can be between 1 and 80%. It is for example 50%.
    The opening time / closing time of the injection valve is for example between 1 and 80%, such as between 40 and 80%.
    The duration of a purge gas injection pulse is for example of the order of one second and the duration of closing of the injection valve is for example of the order of one second.
    According to an exemplary embodiment, the injection device comprises:
    - a distributor configured to distribute a purge gas in the pumping stages,
    - an injection member per pumping stage interposed between the distributor and a respective pumping stage.
    According to an exemplary embodiment, the injection valve is arranged on a branch of the distributor common to the pumping stages.
    According to an exemplary embodiment, the injection device comprises an injection valve per pumping stage arranged on a respective bypass of the distributor adapted to distribute a purge gas in a respective pumping stage.
    According to an exemplary embodiment, the vacuum pump also comprises an additional injection device comprising:
    - a distributor for distributing a purge gas in the pumping stages,
    - an injection member per pumping stage interposed between the distributor and a respective pumping stage,
    - a continuously controllable injection valve arranged on a branch of the distributor common to the pumping stages, the control device also being configured to control the opening of the at least one continuous injection valve for injecting a gas of continuous purge in the pumping stages.
    The invention also relates to a method of controlling the injection of a purge gas into a primary vacuum pump of the dry type as described above, characterized in that the opening of the at least is controlled an injection valve for injecting purge gas by successive pulses into at least one pumping stage.
    According to an exemplary embodiment of the control method, at least two pulse gas purge durations are different in two pumping stages.
    According to an exemplary embodiment of the control method, a continuous flow of purge gas is also injected into at least one pumping stage by controlling at least one injection valve continuously in opening.
    According to an exemplary embodiment of the control method, the opening of the at least one continuous injection valve is also controlled to inject a continuous purge gas at each pumping stage.
    According to an exemplary embodiment of the control method, the piloting of the injection valves is synchronized in order to offset the injection of the purge gas pulses in at least two pumping stages.
    According to an exemplary embodiment of the control method, the offset of the purge gas pulses is synchronized to open the injection valves in the pumping stages successively in the direction of flow of the gases going from the suction to the discharge of the vacuum pump.
    Other advantages and characteristics will appear on reading the description of the invention, as well as the appended drawings in which:
    Figure 1 shows a very schematic view of a first embodiment of a primary vacuum pump of the dry type.
    Figure 2 shows a graph of purge gas pulses injected into a pumping stage of the vacuum pump of Figure 1 as a function of time.
    Figure 3 shows a view similar to Figure 1 for a second embodiment.
    Figure 4 shows a view similar to Figure 1 for a third embodiment.
    In these figures, identical elements have the same reference numbers. The drawings are simplified to facilitate their understanding.
    The following embodiments are examples. Although the description refers to one or more embodiments, this does not necessarily mean that each reference relates to the same embodiment, or that the characteristics apply only to a single embodiment. Simple features of different embodiments can also be combined or interchanged to provide other embodiments.
    A primary vacuum pump is defined as a volumetric vacuum pump which sucks in, transfers and then pumps out a gas to be pumped. In conventional use, a primary vacuum pump is configured to be able to discharge a gas to be pumped at ambient pressure.
    Figure 1 shows a first embodiment of a primary vacuum pump 1 of the dry type.
    The vacuum pump 1 comprises at least two pumping stages 2a-2e connected in series between a suction 3 and a discharge 4 and in which a gas to be pumped can circulate (the direction of circulation of the pumped gases is illustrated by the arrows on the figure 1).
    In the illustrative example, the vacuum pump 1 has five pumping stages 2a, 2b, 2c, 2d, 2e. Each pumping stage 2a-2e has a respective inlet and outlet. The successive pumping stages 2a-2e are connected in series one after the other by respective inter-stage channels connecting the output of the pumping stage which precedes to the entry of the stage which follows.
    The vacuum pump 1 also comprises two rotors 5 extending in the pumping stages 2a-2e.
    The rotors 5 have for example lobes of identical profiles angularly offset, for example of the "Roots" type, for example of section in the shape of an "eight" or of a "bean", or of the "Claw" type or are of the screw type or another similar principle of a volumetric vacuum pump.
    The rotors 5 are configured to rotate synchronously in the opposite direction to cause a gas to be pumped between the suction 3 and the discharge 4 of the vacuum pump 1. During the rotation, the gas sucked in from the inlet is trapped in the volume generated by the rotors 5 and a stator of the pumping stage 2a-2e, then is driven by the rotors 5 to the next stage.
    The rotors 5 are rotated by a motor M of the vacuum pump 1.
    The vacuum pump 1 also comprises an injection device 9 configured to distribute a purge gas, such as a neutral gas, such as air or nitrogen, in at least one pumping stage 2a- 2e and a control device 10 configured to control the injection device 9.
    The injection device 9 comprises at least one injection member 12a-12e and at least one controllable injection valve 13.
    The injection member 12a-12e, such as a calibrated orifice (also called a nozzle), an injection nozzle or such as a flow controller (or “mass flow”), is configured to limit the flow rate of the purge gas in the pumping stage 2a-2e, for example at a value less than 200 sim (or 338 Pa.m 3 / s).
    The at least one controllable injection valve 13 is for example a solenoid valve such as electromagnetic or piezoelectric. This valve can be controlled in all or nothing: it is either open or closed. These valves have the advantage of being simple, compact and inexpensive. The at least one injection valve 13 is interposed between a source of supply of purge gas and the at least one injection member 12a-12e.
    The control device 10 comprises one or more controllers or microcontrollers or processors and a memory for executing sequences of program instructions implementing a method for controlling the injection of a purge gas into the vacuum pump 1 in which controls the at least one injection valve 13 in opening and closing to inject a purge gas by successive pulses P into at least one pumping stage 2a-2e (Figure 2).
    The command to open / close the at least one injection valve 13 makes it possible to draw the injection of the purge gas alternating injection phases (or pulses) with phases without injection or with injection of lesser flow.
    This mode of injection in pulsed flow, that is to say by train of pulses, makes it possible to create wave fronts at the time of the injection allowing a separation of the solid by-products which is more effective than an injection continuous purge gas.
    In addition, the pulsed gas injection of the purge gas makes it possible to be able to maintain an average value of the flow of purged gas injected of the same order of magnitude as that of a conventional continuous purge gas injection.
    The control of the at least one injection valve 13 in all or nothing makes it possible to produce control slots making it possible to ensure injection by successive pulses with rising edges having steep slopes which are more effective for detaching the under- solid products. The slope of the rising edge of the purge gas flow on a pulse is for example greater than 100slm / s.
    The control device 10 is, for example, on board the vacuum pump 1.
    The frequency and duration of the pulses can be adjusted according to the nature of the by-products to be discharged. It is thus possible to space or multiply the number of pulses according to the desired effect.
    The frequency (opening / closing rhythm), the duration, the duty cycle (opening time / closing time) and the amplitudes of the purge gas implusions can be parameters adjustable by the user by means of an interface. control device 10.
    The purge gas flow injected by pulses is for example between 10slm (or 17Pa.m 3 / s) and 120slm (or 202Pa.m 3 / s), such as 100slm (or 169Pa.m 3 / s).
    The pulse frequency is for example between 0.1 Hz and 5Hz, such as 0.5Hz, that is to say an opening every two seconds.
    The duty cycle (the opening time / closing time of the injection valve) can be between 1 and 80%, as between 40 and 80%. It is for example 50%.
    The duration of a purge gas injection pulse is for example of the order of one second and the duration of closing of the injection valve is for example of the order of one second.
    According to a first embodiment shown in Figure 1, the injection device 9 includes a distributor 11 (called "manifold" in English) configured to distribute a purge gas from the power source in each of the pumping stages 2a-2e (the direction of circulation of the purge gas is illustrated by the arrows in FIG. 1).
    For this, the distributor 11 has a common branch 14 connected to branches 15a, 15b, 15c, 15d, 15e. The branches 15a-15e are adapted to distribute a purge gas in a respective pumping stage 2a-2e.
    The injection valve 13 is arranged on a branch 14 of the distributor 11 common to the pumping stages 2a-2e.
    The injection device 9 further comprises an injection member 12a, 12b, 12c, 12d, 12e per pumping stage 2a-2e. They are interposed between the distributor 11 and a respective pumping stage 2a-2e.
    In operation, the opening of the at least one injection valve 13 is controlled to inject purge gas by successive pulses into all of the pumping stages 2a-2e.
    This embodiment has the advantage of being able to be easily implemented on existing vacuum pumps by simply modifying the control program of the at least one injection valve 13 of the injection device 9.
    Since the controllable injection valve 13 is common to all the pumping stages 2a-2e, the purge gas is injected in successive pulses into the pumping stages 2a-2e simultaneously and over similar durations. In addition, between two pulses of purge gas, the flow of purge gas injected is zero since the at least one injection valve 13 is controllable in all or nothing.
    In the case of injection members 12a-12e produced in the form of flow controllers controllable by the control device 10, it is however possible to provide particular pulse amplitudes on each pumping stage 2a-2e.
    The distributor 11 may also include at least one additional bypass configured to distribute a purge gas in a bearing of the vacuum pump 1 situated at one end of the rotors 5, for example between the motor M and the pumping stage 2e situated in the side of discharge 4 here attached to engine M.
    Figure 3 shows a second embodiment.
    This example differs from the previous one in that the injection device 9 comprises an injection valve 16a-16e per pumping stage 2a-2e arranged on a respective branch 15a-15e of the distributor 11.
    In operation, the opening of the injection valves 16a-16e is controlled to inject pulses of purge gas into at least one pumping stage 2a-2e.
    In this example, it is possible to control each injection valve 15a-15b independently. Thus, the purge gas pulses can be injected into one, several or all of the pumping stages 2a-2e, simultaneously or not.
    It is also possible to provide for injecting a continuous flow of purge gas into the pumping stage or stages in which purge gas is not injected in successive pulses by controlling at least one injection valve 16a-16e continuously. in opening. For example, a pulse of purge gas is injected into the so-called low pressure pumping stage 2a situated on the suction side 3 and a continuous purging gas is injected into the other pumping stages 2b-2e.
    Furthermore, the purge gas pulses can be injected over different or similar durations into the different pumping stages 2a-2e. It is expected, for example, that at least two durations of purge gas pulses are different in two pumping stages 2a-2e. The pulse frequencies can therefore also be different for each pumping stage 2a-2e.
    Provision may also be made to synchronize the control of the injection valves 16a16e in order to offset the injection of the purge gas pulses in at least two pumping stages 2a-2e. In this case, the injection valves 16a-16e of at least two pumping stages 2a-2e are not opened at the same time or the simultaneous opening times are relatively short compared to the total duration of the pulse.
    For example, the offset of the purge gas pulses is synchronized to open the injection valves 16a-16e in the pumping stages 2a-2e successively in the direction of flow of the gases going from the suction 3 towards the delivery 4 of the vacuum pump 1. Thus, the injection valve 16a of the pumping stage 2a called low pressure on the suction side 3 is first opened, then that associated with the second pumping stage 2b and thus continued up to the pumping stage 2e, said to be of high pressure on the discharge side 4. A gaseous wave front moving in the direction of flow of the pumped gases is thus artificially improved, improving the evacuation efficiency of the subs - solid products.
    Several wave fronts can thus be created simultaneously in the vacuum pump 1. For example, the injection valve 16e of the pumping stage 2e, said to be discharge, can be opened simultaneously with the injection valve 16a of the pumping stage 2a called low pressure. A new wavefront is starting while a previous wavefront is nearing completion.
    We understand that by increasing the number of injection valves, we multiply the possible choices.
    In the case of injection members 12a-12e produced in the form of flow controllers controllable by the control device 10, it is also possible to provide particular pulse amplitudes on each pumping stage 2a-2e.
    Figure 4 shows a third exemplary embodiment.
    In this example, the vacuum pump 1 includes an additional injection device 17.
    The additional injection device 17 comprises a distributor 11 for distributing a purge gas in the pumping stages 2a-2e, an injection member 12a-12e per pumping stage 2a-2e interposed between the distributor 11 and a stage of pumping 2a2e respectively and a continuously controllable injection valve 18 arranged on a branch 14 of the distributor 11 common to the pumping stages 2a-2e.
    The continuously controllable injection valve 18 is for example a solenoid valve such as electromagnetic or piezoelectric. This valve is for example controllable in all or nothing.
    The control device 10 is also configured to control the opening of the at least one continuous injection valve 18 to inject a continuous purge gas into at least one pumping stage 2a-2e.
    Since a flow of purge gas can be constantly ensured in all the pumping stages 2a-2e by means of the additional injection device 17, the injection device 9 can comprise only one or a few injection members opening out. in pumping stages 2a-2e joined or not and not to include injection members and injection valves in all pumping stages 2a-2e.
    It is also possible, as in the second embodiment, that the injection device 9 comprises a distributor 11 configured to distribute a purge gas in the pumping stages 2a-2e, an injection member 12a-12e per stage pump 2a-2e interposed between the distributor 11 and a respective pumping stage 2a-2e and an injection valve 16a-16e per pumping stage 2a-2e arranged on a respective branch 15a-15th of the distributor 11.
    In operation, control the opening of the at least one injection valve 16a-16e to inject pulses of purge gas into at least one pumping stage 2a-2e and control the opening of the at least one valve continuous injection 18 to inject a continuous purge gas at each pumping stage 2a-2e.
    The flow of the purge gas injected by successive pulses is for example between 10slm and 120slm, such as 100slm and the flow of the purge gas injected continuously is for example between 10slm and 120slm, such as 50slm (or 84Pa.m 3 / s). The pulse frequency is for example 0.5Hz. The duty cycle is for example 50%.
    Consequently, in addition to the possibilities described for the second embodiment, it is possible here to also provide a non-zero purge flow between two pulses of purge gas in the same pumping stage 2a-2e. A purge can thus be maintained continuously in all the stages of the vacuum pump 1 simultaneously with jerks of purge wave fronts.
    权利要求:
    Claims (14)
    [1" id="c-fr-0001]
    1. Dry type primary vacuum pump (1) comprising:
    - at least two pumping stages (2a-2e) connected in series between a suction (3) and a discharge (4) of the vacuum pump (1),
    - two rotors (5) extending in the pumping stages (2a-2e), the rotors (5) being configured to rotate synchronously in the opposite direction to cause a gas to be pumped between the suction (3) and the delivery (4),
    - an injection device (9) configured to distribute a purge gas in at least one pumping stage (2a-2e), comprising:
    o at least one injection member (12a-12e), and o at least one injection valve (13; 16a-16e) controllable in all or nothing intended to be interposed between a supply source of purge gas and the at least one injection member (12a-12e), characterized in that the vacuum pump (1) further comprises a control device (10) configured to control the opening and closing of the at least one valve injection (13; 16a-16e) for injecting a purge gas by successive pulses into at least one pumping stage (2a-2e).
    [2" id="c-fr-0002]
    2. Vacuum pump (1) according to claim 1, characterized in that the injection device (9) comprises:
    - a distributor (11) configured to distribute a purge gas in the pumping stages (2a-2e),
    - an injection member (12a-12e) per pumping stage (2a-2e) interposed between the distributor (11) and a respective pumping stage (2a-2e).
    [3" id="c-fr-0003]
    3. Vacuum pump (1) according to claim 2, characterized in that the injection valve (13) is arranged on a branch (14) of the distributor (11) common to the pumping stages (2a-2e).
    [4" id="c-fr-0004]
    4. Vacuum pump (1) according to claim 2, characterized in that the injection device (9) comprises an injection valve (16a-16e) per pumping stage (2a-2e) arranged on a bypass ( 15a-15e) respectively of the distributor (11) adapted to distribute a purge gas in a respective pumping stage (2a-2e).
    [5" id="c-fr-0005]
    5. Vacuum pump (1) according to one of the preceding claims, characterized in that it further comprises an additional injection device (17) comprising:
    - a distributor (11) for distributing a purge gas in the pumping stages (2a-2e),
    - an injection member (12a-12e) per pumping stage (2a-2e) interposed between the distributor (11) and a respective pumping stage (2a-2e),
    - a continuous injection valve (18) controllable and arranged on a branch (14) of the distributor (11) common to the pumping stages (2a-2e), the control device (10) also being configured to control the opening of the at least one continuous injection valve (18) for injecting a continuous purge gas into the pumping stages (2a-2e).
    [6" id="c-fr-0006]
    6. Vacuum pump (1) according to one of the preceding claims, characterized in that the pulse frequency is between 0.1 Hz and 5Hz.
    [7" id="c-fr-0007]
    7. Vacuum pump (1) according to one of the preceding claims, characterized in that the flow of purge gas injected by pulses is between 17Pa.m 3 / s and 202Pa.m 3 / s.
    [8" id="c-fr-0008]
    8. Vacuum pump (1) according to one of the preceding claims, characterized in that the opening time / closing time of the injection valve is between 1 and 80%, as between 40 and 80 %.
    [9" id="c-fr-0009]
    9. A method of controlling the injection of a purge gas into a primary vacuum pump (1) of the dry type according to one of the preceding claims, characterized in that the opening of the at least is controlled an injection valve (13; 16a-16e) for injecting purge gas by successive pulses into at least one pumping stage (2a-2e).
    [10" id="c-fr-0010]
    10. A method of controlling the injection of a purge gas according to claim 9 in a vacuum pump according to claim 4 or according to one of claims 5 to 8 taken with claim 4, characterized in that at at least two purge gas pulse durations are different in two pumping stages (2a-2e).
    [11" id="c-fr-0011]
    11. A method of controlling the injection of a purge gas according to one of claims 9 or 10 in a vacuum pump according to claim 4 or according to one of claims 5 to 8 taken with claim 4, characterized in that in addition, a continuous flow of purge gas is injected into at least one pumping stage (2a-2e) by controlling at least one injection valve (16a-16e) continuously in opening.
    [12" id="c-fr-0012]
    12. A method of controlling the injection of a purge gas according to one of claims 9 to 11 in a vacuum pump according to claim 5 or according to one of claims 6 to 8 taken with claim 5, characterized in that in addition, the opening of the at least one continuous injection valve (18) is controlled to inject a continuous purge gas at each pumping stage (2a-2e).
    [13" id="c-fr-0013]
    13. A method of controlling the injection of a purge gas according to one of claims 9 to 12 in a vacuum pump according to claim 4 or according to one of claims 5 to 8 taken with claim 4, characterized in that the piloting of the injection valves (16a-16e) is synchronized in order to offset the injection of the purge gas pulses in at least two pumping stages (2a-2e).
    [14" id="c-fr-0014]
    14. A method of controlling the injection of a purge gas according to claim 13, characterized in that the offset of the purge gas pulses is synchronized to open the injection valves (16a-16e) in the stages of pumping (2a-2e) successively in the direction of gas flow from the suction (3) to the discharge (4) of the vacuum pump (1).
    类似技术:
    公开号 | 公开日 | 专利标题
    EP3628870A1|2020-04-01|Dry type primary vacuum pump and method for controlling the injection of a purging gas
    EP2875240B1|2020-10-07|Method and device for pumping of a process chamber
    FR2705165A1|1994-11-18|Plasma treatment installation and method for its operation.
    EP3485168B1|2020-04-22|Method for lowering the pressure in a loading and unloading lock and associated pumping unit
    EP2909450B1|2016-12-07|Jet pump for depressurizing lubrication chambers of a turbomachine, having independent double injectors
    FR2689185A1|1993-10-01|Engine oil pump assembly.
    WO2010070240A1|2010-06-24|Method for lowering the pressure in a charge-discharge lock and associated equipment
    WO2018184853A1|2018-10-11|Pumping unit and use
    EP3737864A1|2020-11-18|Vacuum pump of dry type and method for controlling a vacuum pump synchronous motor
    FR3094762A1|2020-10-09|Dry type vacuum pump and pumping installation
    FR3105313A1|2021-06-25|Vacuum pump and purge gas injection method
    WO2019042868A1|2019-03-07|Leak detector and leak detection method for leak-testing objects
    FR3097599A1|2020-12-25|Dry-type primary vacuum pump and method of controlling the injection of a purge gas
    WO2018224253A1|2018-12-13|Method for monitoring an operating state of a pumping device
    FR3109806A1|2021-11-05|Primary Vacuum Pump and Installation
    EP3105455B1|2018-08-29|Pumping system and method for lowering the pressure in a load-lock chamber
    FR3112176A1|2022-01-07|Primary Vacuum Pump and Installation
    WO2021008834A1|2021-01-21|Pumping unit
    BE469831A|
    FR2483019A1|1981-11-27|Compressor to separate gas and liquid - has plates projecting into rotor annulus to separate gas ring into variable volume zones
    FR2988014A1|2013-09-20|DEVICE FOR PULSATION OF A FLUID
    同族专利:
    公开号 | 公开日
    EP3628870B1|2021-11-03|
    JP2020063737A|2020-04-23|
    FR3086705B1|2020-10-23|
    US20200102960A1|2020-04-02|
    KR20200035872A|2020-04-06|
    CN110953153A|2020-04-03|
    TW202012788A|2020-04-01|
    EP3628870A1|2020-04-01|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    US20060032442A1|2004-07-15|2006-02-16|Kazuhide Hasebe|Method and apparatus for forming silicon oxide film|
    GB2500610A|2012-03-26|2013-10-02|Edwards Ltd|Apparatus to supply purge gas to a multistage vacuum pump|
    WO2014012896A2|2012-07-19|2014-01-23|Adixen Vacuum Products|Method and device for pumping of a process chamber|WO2021219307A1|2020-04-29|2021-11-04|Pfeiffer Vacuum|Primary vacuum pump and installation|
    FR3112176A1|2020-10-09|2022-01-07|Pfeiffer Vacuum|Primary Vacuum Pump and Installation|
    CN112024539A|2020-06-29|2020-12-04|朝阳黑猫伍兴岐炭黑有限责任公司|Carbon black pipeline carbon deposit processing apparatus|
    CN112705538A|2020-12-04|2021-04-27|浙江银轮机械股份有限公司|Roots pump and screw pump vacuum unit cleaning assembly|
    法律状态:
    2019-09-25| PLFP| Fee payment|Year of fee payment: 2 |
    2020-04-03| PLSC| Publication of the preliminary search report|Effective date: 20200403 |
    2020-09-25| PLFP| Fee payment|Year of fee payment: 3 |
    2021-09-24| PLFP| Fee payment|Year of fee payment: 4 |
    优先权:
    申请号 | 申请日 | 专利标题
    FR1858887A|FR3086705B1|2018-09-27|2018-09-27|DRY TYPE PRIMARY VACUUM PUMP AND PROCESS FOR CONTROL OF THE INJECTION OF A PURGE GAS|FR1858887A| FR3086705B1|2018-09-27|2018-09-27|DRY TYPE PRIMARY VACUUM PUMP AND PROCESS FOR CONTROL OF THE INJECTION OF A PURGE GAS|
    TW108125580A| TW202012788A|2018-09-27|2019-07-19|Primary vacuum pump of dry type and method for controlling the injection of a purge gas|
    EP19198698.3A| EP3628870B1|2018-09-27|2019-09-20|Dry type primary vacuum pump and method for controlling the injection of a purging gas|
    KR1020190116757A| KR20200035872A|2018-09-27|2019-09-23|Primary vacuum pump of dry type and method for controlling the injection of a purge gas|
    JP2019172498A| JP2020063737A|2018-09-27|2019-09-24|Dry-type primary vacuum pump and method of controlling injection of purge gas|
    CN201910911235.9A| CN110953153A|2018-09-27|2019-09-25|Dry primary vacuum pump and method of controlling injection of purge gas|
    US16/583,318| US20200102960A1|2018-09-27|2019-09-26|Primary vacuum pump of dry type and method for controlling the injection of a purge gas|
    [返回顶部]